A method and apparatus to create two dimensional and three dimensional structures using a maskless photolithography system is provided. In an embodiment, the pattern generator comprises a micromirror array wherein the positioning of the mirrors in the micromirror array and the time duration of exposure can be modulated to produce patterns to photoform photosensitive material. The desired pattern can be designed and stored using conventional computer aided drawing techniques and can be used to control the positioning of the individual mirrors in the micromirror array to reflect the corresponding desired pattern. A fixture for mounting of the substrate can be incorporated and can allow the substrate to be moved three dimensions. The fixture can be rotated in one, two, or three directions.
Fries, David P., "Method and apparatus for maskless photolithography" (2009). USF Patents. 566.
University of South Florida